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ICP-MS Semiconductor Method Development

Agilent Japan application scientist Kazuhiro et al. used prepFAST-S and 8900s ICP-QQQ of ESI Company of the United States to analyze ultrapure water and hydrogen peroxide in a fully automated standard addition method (MSA), achieving ppq to ppt levels of concentration The ability to detect trace elements (including B, Si, P, S and other non-metals).
The article particularly emphasizes the versatility of the method. Table 1 is an almost complete reproduction of the method parameters in the Agilent 8900s Electronic Grade Hydrogen Peroxide Application Note (5991-7701EN). It can be seen that such a "straightforward" method transfer reflects that the performance difference between each 8900s is very small. Even if analysts do not have much experience, they can still obtain satisfactory results by relying on automated sampling devices and mature method transfer. analysis results.

Let's compare these method parameters carefully. The Cool-NH3-soft of 8900s in this article is very similar to the Cool-NH3 of 8800s in the previous article, which shows that the method routes of the two modes are basically the same. But the Cool-NH3 of 8900s is different: the extraction lens 1 is set to a negative voltage (-150V) and the Q1 entrance lens is set to a positive voltage (-15V), both of which increase the ion transmittance.
Compared with the 8800s, the Cool-NH3 of the 8900s adopts a higher reaction gas flow rate to reduce the background first, so choosing to use the negative bias voltage of the lens to adjust the ion transmittance can counteract the adverse effect of the overall signal attenuation caused by the CRC drop background. In Figure 1, Ca chooses Cool-NH3-soft, while Fe chooses Cool-NH3. The essence is that high sensitivity is preferred under the premise that the background meets trace analysis. The side also shows that the determination of ultra-trace Ca needs to maintain a lower background than Fe.
https://www.bing-lab.com/blogs/news/reproduced-icp-ms-semiconductor-method-development

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